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Solutions

Failure Analysis Lab

Overview

The lab identifies defects across the whole package, from encapsulant and flux to TSV, micro-bump and interposer.

  • Encapsulant — incomplete fill, wire sweep, warpage, delamination, void
  • Flux — flux residue, outgassing, corrosion
  • TSV — delamination, crack, void, non-protrusion
  • Micro-bump — crack, void, cold joint, bridge
  • Substrates — warpage, contamination, crack
  • Leadframe — contamination
  • Interposer — delamination, RDL bridge, contamination
Failure-analysis defect inspection interfaceSemiconductor failure localization interface

Reliability

Non-Destructive Analysis

  • Non-destructive analysis is the first step of failure analysis.
  • There are the technologies to detect the defects without damaging samples and which including two parts.
  • One is electrical test and the other is failure observation and localization. Electrical testing machines are function test, O/S test, curve tracer and so on.
  • The failure observation toolings are HR-OM, IR OM, X-ray, SAT, etc
  • The failure localization toolings are TDR, OBIRCH, thermal lock-in, etc.
Electrical Test
TDR, Probing station, Curve tracer, DCT
Inspection Analysis
OM, X-ray, SAT, Hi-resolution OM, IR-OM
Surface Analysis
EDX
Structure Analysis
W-SEM, FE-SEM, Table SEM
Localization
Lock-in thermography, OBIRCH

Destructive Analysis

  • After non-destructive analysis, the defect location can be determined.
  • The destructive samples preparations before observation are also call destructive analysis.
  • The most common uses are cross-section, ion milling, PECS, FIB, and etc.
  • Furthermore, SEM, EDX, XPS and ESCA could observe the failure or the defects.
Structure Analysis
X-section, FIB, TEM, P-FIB
Surface Etch/Treatment
Ion miller, PECS, FIB

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