Advanced Packaging from FOWLP to FOPLP Development of FanOut Chip Last in 300 mm Panel

Technology Papers
Advanced Packaging from FOWLP to FOPLP Development of FanOut Chip Last in 300 mm Panel

As the demand for high-performance computing (HPC) continues to rise, processor designs are evolving towards chiplet integration and ASIC-HBM architectures, leveraging high-density interconnection technologies. While wafer-level fan-out packaging (FOWLP) has become a widely adopted solution, it faces challenges such as warpage control, complex processes, and carrier utilization limitations. To address these challenges, panel-level fan-out packaging (FOPLP) has emerged as a promising alternative.

FOPLP not only offers a higher carrier utilization ratio compared to wafer-level processes but also enhances material efficiency. By reducing handling and transfer time, panel-level manufacturing can achieve higher throughput, leading to cost advantages and improved scalability. Our research presents a 300mm panel-level fan-out solution specifically designed for chiplets integration in HPC applications.

To further enhance patterning precision in panel-level processing, we have implemented an innovative Laser Direct Imaging (LDI) technique. Additionally, we investigated key factors influencing panel warpage, chip-on-panel solder joint integrity, and process optimization. The results demonstrate the successful implementation of Fan-Out Chip Last technology on a 300mm panel platform, achieving higher density, larger module sizes, and improved reliability.

These advancements make 300mm panel-level fan-out an attractive solution to meet the evolving demands of next-generation HPC and AI applications. After rigorous stress testing and structural analysis, our Test Vehicle-1 (FOPLP including 10 chiplets (SoC-1 and SoC-2) integrated with 10 Si bridge dies) exhibited excellent adhesion with no delamination across all interlayers, while Test Vehicle-2 (FOPLP including SoC-1 and SoC-2 die integrated with multiple-layer RDL) also passed reliability tests, confirming exceptional interlayer quality.

Published in: 2025 IEEE 75th Electronic Components and Technology Conference (ECTC)

DOI: 10.1109/ECTC51687.2025.00095